Plasma-assisted atomic layer deposition: Basics, opportunities, and challenges

Profijt, HB; Potts, SE; Van De Sanden, MCM; Kessels, WMM; (2011) Plasma-assisted atomic layer deposition: Basics, opportunities, and challenges. Journal of Vacuum Science and Technology A: Vacuum, Surfaces and Films , 29 (5) 10.1116/1.3609974 . Green open access

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