Atomic layer deposition of B-doped ZnO using triisopropyl borate as the boron precursor and comparison with Al-doped ZnO

Garcia-Alonso, D; Potts, SE; Van Helvoirt, CAA; Verheijen, MA; Kessels, WMM; (2015) Atomic layer deposition of B-doped ZnO using triisopropyl borate as the boron precursor and comparison with Al-doped ZnO. Journal of Materials Chemistry C , 3 (13) pp. 3095-3107. 10.1039/c4tc02707h . Green open access

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