Huang, S; Volynets, V; Hamilton, JR; Nam, SK; Song, I-C; Lu, S; Tennyson, J; Huang, S; Volynets, V; Hamilton, JR; Nam, SK; Song, I-C; Lu, S; Tennyson, J; Kushner, MJ; - view fewer (2018) Downstream etching of silicon nitride using continuous-wave and pulsed remote plasma sources sustained in Ar/NF3/O-2 mixtures. Journal of Vacuum Science & Technology A , 36 (2) , Article 021305. 10.1116/1.5019673 .
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Medicine by Alexandros G.Sfakianakis,Anapafseos 5 Agios Nikolaos,Crete 72100,Greece,tel :00302841026182 & 00306932607174
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Σάββατο 5 Μαΐου 2018
Downstream etching of silicon nitride using continuous-wave and pulsed remote plasma sources sustained in Ar/NF3/O-2 mixtures
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