Chem. Commun., 2017, Accepted Manuscript
DOI: 10.1039/C7CC07475A, Communication
DOI: 10.1039/C7CC07475A, Communication
Xinjun Hu, Dongchen Bai, Yiqi Wu, Songbo Chen, Yu Ma, Yue Lu, Yuanzhi Chao, Yongxiao Bai
Hydroxyl radicals ([round bullet, filled]OH) generated from a UV/O3 solution reaction is used to efficiently etch graphene oxide nanosheets under moderate conditions. Reduced holey graphene oxide is directly used as a supercapacitor...
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Hydroxyl radicals ([round bullet, filled]OH) generated from a UV/O3 solution reaction is used to efficiently etch graphene oxide nanosheets under moderate conditions. Reduced holey graphene oxide is directly used as a supercapacitor...
The content of this RSS Feed (c) The Royal Society of Chemistry
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